Xinhua Liang, Linda & Bipin Doshi Associate Professor
Department of Chemical and Biochemical Engineering
Missouri University of Science & Technology

Surface-Functionalized Particles for Energy and Environmental Applications

Biosketch: Dr. Xinhua Liang is the Linda and Bipin Doshi Associate Professor in the Doshi Department of Chemical and Biochemical Engineering at Missouri University of Science and Technology (formerly University of Missouri-Rolla). He joined the Doshi Department as an Assistant Professor in 2012 and was promoted to Associate Professor with tenure in 2017. He attended the Chemical Engineering program at Tianjin University, earning B.S. in 2001 and M.S. in 2003. He received Ph.D. in Chemical Engineering from the University of Colorado Boulder in 2008 and had three years of postdoctoral training there. Dr. Liang’s research interests are in nanostructured materials synthesis and functionalization by atomic/molecular layer deposition and applying this technology in a broad range of energy and environmental applications including catalysis, storage batteries, and gas and liquid separation. He has published more than 120 peer-reviewed journal papers and holds four patents in key areas of surface functionalization and applications.

Abstract: Fine particles have gained increased interest in a variety of fields for different applications. The performance of particles could be greatly improved when such particles are coated with ultra-thin inorganic/organic films or decorated with highly dispersed metal nanoparticles. Atomic layer deposition (ALD) and molecular layer deposition (MLD) are gas phase thin film growth techniques with precise atomic or molecular layer control based on sequential, self-limiting surface chemical reactions. ALD has focused principally on the formation of oxide thin films and metal nanoparticles on solid substrates. MLD, which is similar to ALD, can deposit polymer films or hybrid organic/inorganic polymer films using suitable precursors. Flow reactor systems, such as fluidized bed reactors, are well suited for large scale operations of ALD/MLD on particle substrates. In this process, the particles are normally fluidized by using an inert gas. Precursor doses can be delivered to a bed of particles sequentially and, in most cases, can be utilized at nearly 100% efficiency without precursor breakthrough and loss with the assistance of an in-line downstream mass spectrometer. This presentation will introduce ALD/MLD chemistry and discuss particle functionalization by ALD/MLD in a fluidized bed reactor and the versatility of the technique for the fabrication of novel functional materials for energy and environmental applications including catalysts and lithium-ion batteries. 
 

Xinhua Liang, Linda & Bipin Doshi Associate Professor
Department of Chemical and Biochemical Engineering
Missouri University of Science & Technology

Surface-Functionalized Particles for Energy and Environmental Applications

Biosketch: Dr. Xinhua Liang is the Linda and Bipin Doshi Associate Professor in the Doshi Department of Chemical and Biochemical Engineering at Missouri University of Science and Technology (formerly University of Missouri-Rolla). He joined the Doshi Department as an Assistant Professor in 2012 and was promoted to Associate Professor with tenure in 2017. He attended the Chemical Engineering program at Tianjin University, earning B.S. in 2001 and M.S. in 2003. He received Ph.D. in Chemical Engineering from the University of Colorado Boulder in 2008 and had three years of postdoctoral training there. Dr. Liang’s research interests are in nanostructured materials synthesis and functionalization by atomic/molecular layer deposition and applying this technology in a broad range of energy and environmental applications including catalysis, storage batteries, and gas and liquid separation. He has published more than 120 peer-reviewed journal papers and holds four patents in key areas of surface functionalization and applications.

Abstract: Fine particles have gained increased interest in a variety of fields for different applications. The performance of particles could be greatly improved when such particles are coated with ultra-thin inorganic/organic films or decorated with highly dispersed metal nanoparticles. Atomic layer deposition (ALD) and molecular layer deposition (MLD) are gas phase thin film growth techniques with precise atomic or molecular layer control based on sequential, self-limiting surface chemical reactions. ALD has focused principally on the formation of oxide thin films and metal nanoparticles on solid substrates. MLD, which is similar to ALD, can deposit polymer films or hybrid organic/inorganic polymer films using suitable precursors. Flow reactor systems, such as fluidized bed reactors, are well suited for large scale operations of ALD/MLD on particle substrates. In this process, the particles are normally fluidized by using an inert gas. Precursor doses can be delivered to a bed of particles sequentially and, in most cases, can be utilized at nearly 100% efficiency without precursor breakthrough and loss with the assistance of an in-line downstream mass spectrometer. This presentation will introduce ALD/MLD chemistry and discuss particle functionalization by ALD/MLD in a fluidized bed reactor and the versatility of the technique for the fabrication of novel functional materials for energy and environmental applications including catalysts and lithium-ion batteries.